Dual Beam Systems offer the unique capability of sculpting, patterning and fabricating structures at the nano- or micro-scale with the Focussed Ion Beam (FIB) whilst simultaneously analysing the sample with the high resolution, non-destructive, Scanning Electron Microscope (SEM) probe.
Materials can be milled or deposited while observing the evolution of the surface topography feature of the specimen with ion beam stimulated secondary electrons. Additionally, a highly focused electron column provides the capabilities for high spatial resolution secondary electron imaging as well as backscattered electron imaging for sub-micron depth characterisation and transmitted electron imaging for micro-texture and grain boundary character determinations.
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Further Information:
The Crossbeam 1560XB – FIB Workstation is a high resolution FE-SEM combined with a FIB Ga+ column plus a multi channel gas injection system for up to five gases (Pt, C and TEOS for deposition and HF and H2O for etching). It is equiped with two detectors: Everhart-Thornley SE and high efficiency In-lens SE detector. The chamber is an extra large analytical chamber (full 6” wafer acces) with 6-axes motorised super eucentric stage with dual joystick controller and 8" airlock. The system is equiped also with 3 nanomanipulators which allow both manipulation and electrical conctating in-situ, and an electron beam-blanker and nanolithography capabilities.
The main application areas are Nanofabrication and prototyping (below 50nm resolution), FIB site specific cross sectioning and SEM inspection on a wide variety of samples (electronics, ceramics, metalurgics, biology…), TEM lamelas preparation, Circuit Editing and electrical and mechanical inspection in vaccum conditions, nanolithography both with ions or electrons... Actually, due to its high performance and accesories many other applications arise continously, so do not hesitate to contact for your specific needs or application.









